Overview:

The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer of better than 10 nm with maximum substrate size of up to 6” wafer.

Applications:

Micro/nano scale pattern transfer and replication.

Specifications:

T-NIL and UV-NIL
Resolution: < 10 nm
Substrate size: up to 6” wafer
Substrate thickness: up to 1 mm

Superusers:

Bjarke Rolighed Jeppesen