Overview:

The wet bench is used for resist processing, includes spinning, baking and developing resists. Integrated into the bench are; 2 spinners, 3 hot plates, 1 convection oven, resist development bath, organic solvent section, 2 quick dump rinsers, temperature-controlled ultrasonication bath, spin dryer, and sink.

Applications:

Processing resists for electron beam lithography, soft lithography, photolithography and nanoimprint lithography.

Superuser:

Bjarke Rolighed Jeppesen