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WPA/APV

CLEANROOM – iNANO

APV for Pegasus

 

Document Responsible: Bjarke Rolighed Jeppesen

Date: 15 June 2021

 

1) Purpose/Formål

The purpose of this APV instruction is to ensure that users, in the iNANO cleanroom, are aware of the potential dangers that exist when working with Pegasus. Users should be aware of the potential hazards listed below. The aim of this APV instruction is also to prevent personal injury to maintenance personnel.

 

2) The Instrument/Instrumentet

The instrument has a load station with two holders for 100 mm wafers. In the software a wafer is selected and moved into the process chamber. In the process chamber Si is removed from areas not covered by resist on the wafer surface. The amount of Si removed from the surface is determined by the duration of the process and the process used.

 

3) Hazardous Conditions/Risiko

Before running a process, make sure that the heating of pipes is on and check the scrubber temperature (575 deg. C).

Take care when the lid at the load station opens.

 

4) Protective Clothing/Beskyttelsesdragt

A cleanroom suit and gloves must be worn.

 

5) Identification/Identifikation

Gases used at the Pegasus equipment:

Toxic: non

Non-toxic: N2, SF6, O2, He, CF4, C4F8

 

6) Maintenance/Vedligeholdelse

At normal use, the scrubber cartridge should be changed every 6 month.

 

7) Additional Safety Notes/Ekstra sikkerhed

Do not open the main chamber until it has cooled down.

 

8) Electrical Safety/ Elsikkerhed

Potentially lethal voltages are present on the equipment. To prevent personal injury, ensure the system, circuit or component is isolated from its source of supply prior to undertaking any maintenance or repair of the equipment. Do not rely on control system interlocks or display messages as an indication that it is safe to work on potentially hazardous items.

  It is recommended to work in pairs when undertaking work on live systems.