Document Responsible: Bjarke Rolighed Jeppesen
Date: 15 June 2021
The purpose of this APV instruction is to ensure that users, in the iNANO cleanroom, are aware of the potential dangers that exist when working with the Thermco 4-stack oven. Users should be aware of the potential hazards listed below. The aim of this APV instruction is also to prevent personal injury to maintenance personnel.
This instrument contains 4 stacked separate oven, each oven with a quartz tube. Each tube has its own heater (max 1050 deg. C) and its own PC-control. All 4 PC’s are connected to a central PC where the anneal-sequense is specified and uploaded to one of the 4 local PC’s. All runs are data logged and all data is collected at the central PC.
Skin burn risk when moving samples out at high temperatures. Notice: Samples can be moved out of the oven at any temperature, there is no interlock, so take care.
Cleanroom suit and gloves must be worn. Use protective eyewear when moving samples out of the oven at high temperatures.
The following chemicals are used in the oven:
Toxic: see description of the applied diffusion paste on wafers/samples (Phosphorus, Boron)
Non-toxic: Nitrogen, Oxygen
Take care when handling the carriers or tubes (Siliconcarbide or quartz) (fragile). There will be residuals on tube walls from diffusion paste (see description of the applied diffusion paste) and cleaning might be needed.
Make sure that the exhaust is working before starting an annealing process. Also, check the incoming gas pressures (N2, O2 and compressed air).
Potentially lethal voltages are present on the equipment. To prevent personal injury, ensure the system, circuit or component is isolated from its source of supply prior to undertaking any maintenance or repair of the equipment. Do not rely on control system interlocks or display messages as an indication that it is safe to work on potentially hazardous items.
It is recommended to work in pairs when undertaking work on live systems.
