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Arias custom design



The wet bench is used for resist processing, includes spinning, baking and developing resists. Integrated into the bench are; 2 spinners, 3 hot plates, 1 convection oven, resist development bath, organic solvent section, 2 quick dump rinsers, temperature-controlled ultrasonication bath, spin dryer, and sink.


Processing resists for electron beam lithography, soft lithography, photolithography and nanoimprint lithography.


Bjarke Rolighed Jeppesen