Aarhus University Seal / Aarhus Universitets segl

Arias custom design

Overview:

The instrument is designed to process resists, including spinning, baking and developing resists. It is custom designed to fit the many different requirements at Aarhus University. Integrated into the bench are: 2 spinners, 3 hot plates, 1 convection oven, resist development bath, organic solvent section, 2 quick dump rinsers, temperature-controlled ultrasonication bath, spin dryer, and sink.

Applications:

Processing resist for electron beam lithography, soft lithography, photolithography and nanoimprint lithography.

Superuser:

Pia Bomholt Jensen.