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FEI Magellan 400 SEM and Raith electron beam lithography

Overview:

The Magellan 400 is a fully digital Field Emission Scanning Electron Microscope (FE SEM). It has an ELPHY Quantum attachment from Raith, which makes it possible to perform electron beam lithography for synthesis of nanostructures.

Applications:

Surface imaging at nanoscale. Surface analysis. Electron beam lithography.

Specifications:

Accelerating Voltage: 50V-30kV, continuously adjustable
Beam current: 0.6 pA to 22 nA
Resolution: 0.8nm@15kV, 0.9nm@1kV
Detection: in-lens SE and BSE

Superuser:


Bjarke Rolighed Jeppesen