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FEI Magellan 400 SEM and Raith electron beam lithography

Overview:

The Magellan 400 is a fully digital Field Emission Scanning Electron Microscope (FE SEM). It achieves high resolution ( It has an ELPHY Quantum attachment from Raith, which makes it possible to perform electron beam lithography for synthesis of nanostructures. Even though the attachment does not include a laser interferometer stage, reasonable stitching can still be achieved. 

Applications:

Surface imaging at nanoscale. Surface analysis. Electron beam lithography.

Specifications:

Accelerating Voltage: 50V-30kV, continuously adjustable
Beam current: 0.6 pA to 22 nA
Resolution: 0.8nm@15kV, 0.9nm@1kV
Detection: in-lens SE and BSE

Superuser:

Jacques Chevallier (SEM)
Bjarke Rolighed Jeppesen (Electron beam lithography)