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WPA/APV

CLEANROOM – iNANO

APV for FEI Magellan 400 SEM and RAITH electron beam lithography

 

Document Responsible: Bjarke Rolighed Jeppesen

Date: February 3, 2014

 

1)    Purpose/Formål

The purpose of this APV instruction is to ensure that employees at iNANO are aware of the potential dangers that exist when working with the FEI Magellan 400 SEM and RAITH electron beam lithography located inside the cleanroom facility. The aim of this APV instruction is also to prevent personal injury to maintenance personnel of the FEI Magellan 400 SEM and RAITH electron beam lithography. All users should be aware of the potential hazards listed.

 

2)    The Instrument/Instrumentet

The instrument is made from five main components:

-Electron source, which emits an electron beam.

-Lens system, consisting of several electromagnetic and electrostatic lenses to deflect the beam.

-Scan generator unit, which feds a signal to the deflection systems, for moving the beam in a raster pattern over the specimen.

-Detection unit, to pick up signals from secondary and backscattered electrons.

-ELPHY Quantum attachment from Raith, which makes it possible to perform electron beam lithography.

 

3)    Hazardous Conditions/Risiko

Liquid N2: Liquid N2 is used in the attached cryo-can. MSDS for liquid nitrogen should be read and understood prior to replenishment.

X-ray safety: The electron microscope is a potential source of ionizing radiation that can be dangerous. The microscope is designed to comply with international standards. The limit is 1uS/h at 10 cm distance. The user is NOT allowed to remove any covers to maintain a safe operation condition. Some covers may act as X-ray shields.

 

4)    Protective Clothing/Beskyttelsesdragt

As a minimum requirement a cleanroom suit, gloves should be worn when handling the specimen chamber and associated vacuum components. When using liquid N2, protective eyewear and cold-isolating gloves are required.

 

5)    Identification/Identifikation

The following chemicals can be found in the FEI magellan 400 SEM and RAITH electron beam lithography:

Toxic: none

Non-toxic: dry N2, liquid N2 (optional)

 

6)    Electrical Safety/ El sikkerhed

Potentially lethal voltages are present in the equipment. To prevent personal injury, ensure the system, circuit or component is isolated from its source of supply prior to undertaking any maintenance or repair of the equipment. Do not rely on control system interlocks or display messages as an indication that it is safe to work on potentially hazardous items.

It is also recommended to work in pairs when undertaking work on live systems.