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Nanonex NX-2600 nanoimprint lithography (NIL)

Overview:

The NX-2600 Nanoimprint Lithography (NIL) instrument allows rapid high resolution replication of template features into spin-coated resist on a range of substrates. The instrument is capable of thermal embossing (T-NIL) using thermoplastic polymers, as well as UV-assisted embossing (UV-NIL) using UV curable polymers. The NX-2600 utilizes Air Cushion Press (ACP) technology that provides excellent uniformity of the pattern transfer of better than 10 nm with maximum substrate size of up to 6” wafer.

Applications:

Micro/nano scale pattern transfer and replication.

Specifications:

T-NIL and UV-NIL
Resolution: < 10 nm
Substrate size: up to 6” wafer
Substrate thickness: up to 1 mm
Front-side alignment: better than 1 µm
Back-side alignment: better than 3 µm
Alignment: split field optics and CCD with X, Y (1 inch), Z (0.25 inch), theta stage (10 deg.).

Superusers:

Ryosuke Ogaki