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WPA/APV

CLEANROOM – iNANO

APV for Vision 320 RIE (Reactive Ion Etch)

 

Document Responsible: Bjarke Rolighed Jeppesen

Date: 15 June 2021

 

1) Purpose/Formål

The purpose of this APV instruction is to ensure that users, in the iNANO cleanroom, are aware of the potential dangers that exist when working with the Vision 320 RIE. Users should be aware of the potential hazards listed below. The aim of this APV instruction is also to prevent personal injury to maintenance personnel.

 

2) The Instrument/Instrumentet

The instrument is made of a chamber pumped by a turbo molecular pump and a roughing pump. The chamber is equipped with a 305 mm substrate platen. It have the capability to etch with either oxygen, argon or a mixture of both.

 

3) Hazardous Conditions/Risiko

Chamber lid is moving automatically. Fingers can get pinched when the closing the chamber.

 

4) Protective Clothing/Beskyttelsesdragt

A cleanroom suit and gloves must be worn.

 

5) Identification/Identifikation

The following chemicals can be found in the Vision 320 RIE:

Toxic: none

Non-toxic: Oxygen, Argon

 

6) Maintenance/Vedligeholdelse

6.1) Cleaning the chamber
Once a month the chamber should be cleaned by wiping the platen with isopropanol and a 5 min high intensity plasma.

6.2) Water cooler


Water levels should be checked each month and refilled if needed.

 

7) Electrical Safety/Elsikkerhed

Potentially lethal voltages are present on the equipment. To prevent personal injury, ensure the system, circuit or component is isolated from its source of supply prior to undertaking any maintenance or repair of the equipment. Do not rely on control system interlocks or display messages as an indication that it is safe to work on potentially hazardous items.

It is recommended to work in pairs when undertaking work on live systems.