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APV for Vision 320 RIE (Reactive Ion Etch)


Document Responsible: Andreas Søe Andersen

Date: 30-01-14


1)    Purpose/Formål

The purpose of this APV instruction is to ensure that employees at iNANO are aware of the potential dangers that exist when working with the Vision 320 RIE located inside the cleanroom facility. The aim of this APV instruction is also to prevent personal injury to maintenance personnel of the Vision 320 RIE. All users who work on the Vision 320 RIE should be aware of the potential hazards listed


2)    The Instrument/Instrumentet

The instrument is made of a chamber pumped by a turbo molecular pump and roughing pump allowing for faster pump down times. The chamber is equipped with a 305 mm substrate platen. It have the capability to etch with either oxygen, argon or a mixture of both.


3)    Hazardous Conditions/Risiko

There is a risk to get fingers jammed so care has to be taken not to work close to the chamber while closing.


4)    Protective Clothing/Beskyttelsesdragt

As a minimum requirement a cleanroom suit, gloves and should be worn when handling process chamber and associated vacuum components.


5)    Identification/Identifikation

The following chemicals can be found in the Vision 320 RIE:

Toxic: none

Non-toxic: Oxygen, Argon


6)    Maintenance/Vedligeholdelse

6.1) Cleaning the chamber
Once a month the chamber should be cleaned by wiping the platen with isopropanol and a 5 min high intensity plasma.

6.2) Water cooler
Water levels should be checked routinely and refilled if needed.


7) Electrical Safety/ El sikkerhed

Potentially lethal voltages are present on the equipment. To prevent personal injury, ensure the system, circuit or component is isolated from its source of supply prior to undertaking any maintenance or repair of the equipment. Do not rely on control system interlocks or display messages as an indication that it is safe to work on potentially hazardous items.

It is also recommended to work in pairs when undertaking work on live systems.