Aarhus University Seal / Aarhus Universitets segl

WPA/APV

CLEANROOM – iNANO

APV for Pegasus

 

Document Responsible: John Lundsgaard Hansen, Pia Bomholt Jensen

Date: 24 Jan 2014

 

1)    Purpose/Formål

The purpose of this APV instruction is to prevent personal injury when working with the Pegasus equipment located inside the iNANO cleanroom facility. All users and maintenance personnel who work on the Pegasus equipment should be aware of the potential hazards listed.

 

2)    The Instrument/Instrumentet

The instrument has a load station with two holders for 100 mm wafers. By the software a wafer is selected and moved into the process chamber. In the process chamber Si is removed from areas not covered by resist on the wafer surface. The amount of Si removed from the surface is determined by the duration of the process and the process used.

 

3)    Hazardous Conditions/Risiko

Before running a process make sure that the heating of pipes are on and check the scrubber temperature (575 deg. C).

Take care when the lid at the load station opens.

 

4)    Protective Clothing/Beskyttelsesdragt

As a minimum requirement a cleanroom suit and gloves should be worn when handling samples.

 

5)    Identification/Identifikation

Gases used at the Pegasus equipment:

Toxic: non

Non-toxic: N2, SF6, O2, He, CF4, C4F8

 

6)    Maintenance/Vedligeholdelse

The scrubber cartridge should be changed every 6 month at normal use.

 

7) Additional Safety Notes/Ekstra sikkerhed

Do not open the main chamber until it has cooled down.

 

8) Electrical Safety/ El sikkerhed

Potentially lethal voltages are present on the equipment. To prevent personal injury, ensure the system, circuit or component is isolated from its source of supply prior to undertaking any maintenance or repair of the equipment. Do not rely on control system interlocks or display messages as an indication that it is safe to work on potentially hazardous items.

It is also recommended to work in pairs when undertaking work on live systems.