Thermco M2454 has 4 ovens, each controlled by a TMX controller. The TMX controllers communicates with a central PC, providing a full graphical user interface for setup, recipe writing and data collection/ analysis.
Two of the 4 oven’s are reserved for in diffusion of phosphorous and boron. One oven for oxide growth on Si and the last oven for annealing of Si samples/wafers.
Max temperature: 1050 ºC
Gas: O2, N2, Compressed air
John Lundsgaard Hansen